Katsunobu Ogura

Title: Innovations by Katsunobu Ogura in Exposure Technology

Introduction

Katsunobu Ogura is a notable inventor based in Sendai, Japan. He has made significant contributions to the field of exposure technology, particularly in the area of reticle exchange methods. His innovative approach has led to advancements that improve the efficiency of exposure apparatuses.

Latest Patents

Ogura holds a patent for a "Mask exchanging method and exposure apparatus." This invention involves a reticle stage that can move while holding a reticle at a predetermined unloading position. An unloading arm performs the unloading of the reticle, and immediately after the reticle is separated, the reticle stage is moved to a loading position. This allows for the loading of a new reticle before the unloading arm completely withdraws, thereby reducing downtime and improving throughput in exposure apparatuses.

Career Highlights

Throughout his career, Katsunobu Ogura has worked with prominent companies such as Nikon Corporation and Sendai Nikon Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in exposure technology.

Collaborations

Ogura has collaborated with notable colleagues, including Kenji Nishi and Hidekazu Kikuchi. Their teamwork has contributed to the advancement of technologies in the field.

Conclusion

Katsunobu Ogura's contributions to exposure technology through his innovative patent demonstrate his expertise and commitment to improving efficiency in the industry. His work continues to influence advancements in the field.