Company Filing History:
Years Active: 2007
Title: Innovations of Katsunari Ozeki in Gapfill Technology
Introduction
Katsunari Ozeki is a notable inventor based in Chiba, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent related to gapfill processes. His work is instrumental in enhancing the efficiency and effectiveness of deposition techniques in the industry.
Latest Patents
Katsunari Ozeki holds a patent for the HDP-CVD multistep gapfill process. This innovative process utilizes a cycling method of HDP-CVD deposition, etching, and deposition steps. The fluent gas used during the first deposition step includes an inert gas such as helium, while the subsequent deposition steps incorporate hydrogen. The higher average molecular weight of the fluent gas during the initial step provides protection to the structures defining the gap during the etching process. In contrast, the lower average molecular weight of the fluent gas in the later steps minimizes sputtering characteristics, making it effective for filling the remaining gap.
Career Highlights
Katsunari Ozeki is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to focus on advancing technologies that improve manufacturing processes. His innovative approach has garnered attention and respect within the field.
Collaborations
Katsunari Ozeki collaborates with talented professionals such as M Ziaul Karim and Bikram Kapoor. These collaborations enhance the development of innovative solutions in semiconductor technology.
Conclusion
Katsunari Ozeki's contributions to the field of semiconductor manufacturing through his patented HDP-CVD multistep gapfill process exemplify his innovative spirit and dedication to advancing technology. His work continues to influence the industry positively.