Location History:
- Tokyo, JP (1983 - 1984)
- Fuchu, JP (1983 - 1990)
Company Filing History:
Years Active: 1983-1990
Title: Innovations of Katsumi Ukai
Introduction
Katsumi Ukai is a notable inventor based in Fuchu, Japan. He has made significant contributions to the field of plasma processing and vacuum technology. With a total of 5 patents to his name, Ukai's work has advanced the efficiency and effectiveness of various processing apparatuses.
Latest Patents
One of his latest inventions is a plasma processing apparatus. This apparatus comprises a vacuum vessel, an anode, and a cathode arranged within the vessel. It features a discharge producing power source that intermittently generates a main discharge between the anode and cathode to process substrates nearby. The design includes a magnetic field setting device with magnetic coils and alternating current power sources, allowing for increased processing speeds while minimizing temperature rise and potential damage to the substrates.
Another significant patent is a vacuum processing apparatus that includes a load-lock chamber, a vacuum transferring chamber, and a processing chamber. Each chamber is equipped with evacuating systems to maintain vacuum conditions. The load-lock chamber features isolation valves for communication with the atmosphere and the vacuum transferring chamber. This innovative design allows for an air-tight chamber space, enhancing the efficiency of substrate processing.
Career Highlights
Katsumi Ukai has established himself as a key figure in his field through his inventive work at Anelva Corporation. His patents reflect a deep understanding of plasma and vacuum technologies, contributing to advancements in manufacturing processes.
Collaborations
Ukai has collaborated with notable colleagues such as Tsutomu Tsukada and Toshio Adachi. Their combined expertise has likely fostered innovative solutions in their respective projects.
Conclusion
Katsumi Ukai's contributions to plasma processing and vacuum technology demonstrate his commitment to innovation. His patents not only enhance processing efficiency but also pave the way for future advancements in the field.