This inventor holds 1 USPTO granted patent. Top assignee: Astec Irie Co., Ltd.. Active years: 1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1999
Title: Innovations by Katsumasa Mito in Waste Liquid Recovery
Introduction
Katsumasa Mito is a notable inventor based in Kitakyushu, Japan. He has made significant contributions to the field of waste management through his innovative methods for recovering etchants from etching waste liquids. His work is particularly relevant in industries that utilize etching processes, where waste management is crucial for environmental sustainability.
Latest Patents
Mito holds a patent for a method designed to recover etchant from etching waste liquid containing iron chloride. This method involves mixing iron powder with an iron chloride waste solution, which contains metal ions that have a lesser ionization tendency than iron ions. The process facilitates a reaction that removes precipitated metals from the waste solution, thereby enhancing the recovery of valuable materials and reducing environmental impact.
Career Highlights
Katsumasa Mito is associated with Astec Irie Co., Ltd., where he has been instrumental in developing innovative solutions for waste management. His patent reflects his commitment to improving industrial processes and promoting sustainability. Mito's work exemplifies the intersection of technology and environmental responsibility.
Collaborations
Mito has collaborated with notable colleagues, including Tsutomu Inoshita and Tadao Kitazawa. These partnerships have likely contributed to the advancement of his research and the successful implementation of his innovative methods.
Conclusion
Katsumasa Mito's contributions to the field of waste management through his patented methods demonstrate the importance of innovation in addressing environmental challenges. His work not only enhances industrial efficiency but also promotes sustainable practices in the etching industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile