Tokyo, Japan

Katsuji Nakamura

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Dai Nippon Printing. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsuji Nakamura. Retrieved from https://idiyas.com/inventor/katsuji-nakamura-2l2uc2m0

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Katsuji Nakamura and His Decorative Materials Patent.

Introduction

Katsuji Nakamura is an inventor based in Tokyo, Japan, associated with Dai Nippon Printing. His work includes a patent for a decorative sheet and decorative material designed for exterior applications.

Latest Patents

Nakamura is credited with 1 patent, titled “Decorative Sheet and Decorative Material.” The invention describes a layered decorative sheet with a polyolefin-containing substrate layer, a design layer, a transparent resin layer that also contains a polyolefin, and a surface protective layer. The protective layer contains cured resin and three ultraviolet absorbers, each with an absorption peak at a progressively longer wavelength. This layered construction is intended for exterior materials.

Career Highlights

Nakamura’s listed patent reflects work on decorative materials and protective surface technologies. His association with Dai Nippon Printing connects his inventive work to a company active in printing and materials.

Collaborations

Mayuko Komurasaki and Yuki Kumagai are identified as Nakamura’s coworkers. The available information does not specify their roles in the patent.

Conclusion

Katsuji Nakamura’s patent focuses on a layered decorative sheet that combines polyolefin materials with a protective resin layer containing multiple ultraviolet absorbers.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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