Katsuhisa Mita

Title: Innovations of Katsuhisa Mita

Introduction

Katsuhisa Mita is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of technology, particularly in the area of photoresist applications. With a total of 3 patents to his name, Mita continues to push the boundaries of innovation.

Latest Patents

Mita's latest patents include a "Method for baking photoresist applied on substrate" and an "Apparatus for baking photoresist applied on substrate." Both inventions focus on improving the efficiency and effectiveness of the baking process for photoresist on photomask substrates. The method involves a unique setup where a photomask substrate is positioned above a lower heating plate, separated by a proximity distance. This design incorporates a heat unifying ring that surrounds the substrate, ensuring uniform heating. The upper heating plate is equipped with a baking chamber that shields the process from external influences, enhancing the overall quality of the application.

Career Highlights

Katsuhisa Mita is associated with Kabushiki Kaisha Toshiba, a leading company in technology and innovation. His work at Toshiba has allowed him to develop and refine his inventions, contributing to advancements in the industry.

Collaborations

Mita has collaborated with notable coworkers such as Yasuo Matsuoka and Kenichi Taniyama. Their combined expertise has fostered a creative environment that encourages innovative solutions in their projects.

Conclusion

Katsuhisa Mita's contributions to the field of technology through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in photoresist applications, showcasing the importance of innovation in the industry.