Company Filing History:
Years Active: 2001
Title: Katsuhisa Kugimiya: Innovator in Plasma Processing Technologies
Introduction
Katsuhisa Kugimiya, an accomplished inventor based in Narita, Japan, has made significant contributions to the field of plasma processing. With a focus on the etching of materials, his work aids in the advancement of various semiconductor manufacturing processes. He is affiliated with Applied Materials, Inc., a leading company in materials engineering.
Latest Patents
Kugimiya holds one patent that showcases his innovative approach to plasma processing. The patent is titled "Plasma processing of tungsten using a gas mixture comprising a fluorinated gas and oxygen." This invention outlines a method and apparatus for effectively etching a substrate that has both a polysilicon layer and an overlying tungsten layer. The technique involves using plasma generated from a gas mixture containing fluorinated gases, such as CF, NF, and SF, in combination with oxygen, enhancing the precision and efficiency of the etching process.
Career Highlights
Throughout his career at Applied Materials, Inc., Kugimiya has been dedicated to improving plasma processing techniques. His inventive work has not only benefited his company but has also contributed to broader advancements in semiconductor technology, driving innovation in the electronics industry.
Collaborations
Kugimiya's innovations have been further strengthened through collaborations with talented colleagues such as Takanori Nishizawa and Daisuke Tajima. These partnerships foster a creative and productive environment, enabling the team to push the boundaries of existing technologies and develop new solutions.
Conclusion
Katsuhisa Kugimiya exemplifies the spirit of innovation and collaboration in the field of plasma processing. His patent on tungsten etching reflects a commitment to advancing semiconductor manufacturing techniques that are crucial in today’s technology-driven world. As a vital member of the Applied Materials, Inc. team, Kugimiya continues to influence the landscape of advanced materials engineering and semiconductor design.