Katsuhisa Kashiwazaki

Title: Innovations of Katsuhisa Kashiwazaki

Introduction

Katsuhisa Kashiwazaki is a notable inventor based in Utsunomiya, Japan. He has made significant contributions to the field of materials science, particularly in the development of advanced plating films and photoreactive devices. With a total of 2 patents to his name, his work showcases innovative solutions for corrosion prevention and electron storage.

Latest Patents

Kashiwazaki's latest patents include a composite plated film and a laminated film. The composite plating film provides long-term rust prevention for steel through a unique method of manufacturing. This film is formed on a metal material and consists of a plating film made from a sacrificial anode metal, with photocatalyst particles dispersed and fixed within it. The photocatalyst particles are composed of a photocatalyst and a semiconductor material. The film is applied to the metal surface using techniques such as electroplating, hot-dipping, or chemical plating. Additionally, his photoreactive devices incorporate a semiconductor and an oxidation-reduction material, which work together to prevent metal corrosion by storing and discharging electrons under light irradiation.

Career Highlights

Throughout his career, Kashiwazaki has worked with various companies, including Koyo Engineering. His innovative approaches have led to advancements in the field, particularly in the development of materials that enhance durability and functionality.

Collaborations

Kashiwazaki has collaborated with notable individuals in his field, including Shuichi Saitoh and Akira Fujishima. These partnerships have contributed to the success of his inventions and the advancement of technology in materials science.

Conclusion

Katsuhisa Kashiwazaki's contributions to innovation in plating films and photoreactive devices highlight his role as a significant inventor in Japan. His work continues to influence advancements in corrosion prevention and materials technology.