Yuki, Japan

Katsuhiro Yoshimura

This inventor holds 1 USPTO granted patent. Top assignee: Showa Denko K.k.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsuhiro Yoshimura. Retrieved from https://idiyas.com/inventor/katsuhiro-yoshimura-hypjr9jv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Katsuhiro Yoshimura: Innovator in Magnetic Recording Media

Introduction

Katsuhiro Yoshimura is a notable inventor based in Yuki, Japan. He has made significant contributions to the field of magnetic recording media. His innovative approach has led to advancements in the production of substrates used in this technology.

Latest Patents

Yoshimura holds a patent for a method of producing a substrate for magnetic recording media. This method efficiently removes alumina abrasive grains that may become stuck during the polishing process. The substrate in question features a NiP plating film formed on the surface of an aluminum alloy substrate. This innovation enhances the quality and efficiency of magnetic recording media production.

Career Highlights

Katsuhiro Yoshimura is associated with Showa Denko K.K., a prominent company in the materials and chemicals sector. His work at the company has been instrumental in developing advanced technologies for magnetic recording applications.

Collaborations

Yoshimura has collaborated with notable colleagues, including Yasuyuki Nakanishi and Hidenori Inada. Their combined expertise has contributed to the success of various projects within the company.

Conclusion

Katsuhiro Yoshimura's contributions to the field of magnetic recording media exemplify the impact of innovative thinking in technology. His patent and work at Showa Denko K.K. highlight the importance of advancements in this area.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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