Katsuhiro Shinosawa

Title: Katsuhiro Shinosawa: Innovator in Advanced Materials

Introduction

Katsuhiro Shinosawa is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of advanced materials, particularly in the development of substrates and wear-resistant components for electronic equipment. With a total of 4 patents to his name, Shinosawa's work has had a notable impact on technology.

Latest Patents

Shinosawa's latest patents include innovative technologies such as an aluminum nitride substrate and a thin film substrate, along with a manufacturing method for these materials. The aluminum nitride substrate features a sintered body that incorporates a rare earth oxide as a sintering additive. This substrate is designed with a machined surface that achieves an arithmetic average roughness of 0.5 µm or less, ensuring optimal conditions for metal thin film deposition. Additionally, he has developed a wear-resistant member for electronic equipment, which consists of a silicon nitride sintered body containing conductivity-enhancing particles. This member is crucial for applications in rotation actuators, such as those found in magnetic recorders and optical disk drives.

Career Highlights

Katsuhiro Shinosawa is currently employed at Kabushiki Kaisha Toshiba, where he continues to push the boundaries of material science. His work has been instrumental in enhancing the performance and reliability of electronic devices.

Collaborations

Shinosawa has collaborated with notable colleagues, including Michiyasu Komatsu and Mineyuki Yamaga, contributing to various projects that advance the field of electronic materials.

Conclusion

Katsuhiro Shinosawa's innovative work in advanced materials has established him as a key figure in the industry. His patents reflect a commitment to improving technology and enhancing the functionality of electronic equipment.