Company Filing History:
1 out of 52,766 
1 out of 16 
1 out of 832,912 Years Active: 2002-2005
Title: The Innovative Contributions of Katsuhiro Kato
Introduction: Katsuhiro Kato, an accomplished inventor based in Kawasaki, Japan, has made significant strides in the field of semiconductor technology and metal polishing compositions. With a total of two patents to his name, Kato's inventions focus on enhancing manufacturing processes and improving product quality in the semiconductor industry.
Latest Patents: Katsuhiro Kato's latest patents include the "Copper-Based Metal Polishing Composition" and the "Method for Manufacturing a Semiconductor Device." The copper-based metal polishing composition is particularly notable as it allows for the polishing of copper or copper alloys without dissolution during the process. This innovation comprises a water-soluble organic acid that reacts with copper to form a copper complex compound, which is insoluble in water. Moreover, the composition incorporates abrasive grains, oxidizing agents, and water, ensuring a high polishing rate for copper materials.
Career Highlights: Throughout his career, Katsuhiro Kato has worked with prominent companies, including Kabushiki Kaisha Toshiba. His contributions have greatly influenced the materials used in semiconductor manufacturing, streamlining processes and enhancing efficiency.
Collaborations: Kato's collaborative efforts with notable individuals such as Hideaki Hirabayashi and Naoaki Sakurai have further enriched his work. Their combined expertise has facilitated advancements in developing innovative solutions for the semiconductor and metal polishing industries.
Conclusion: Katsuhiro Kato's inventions, particularly in metal polishing compositions and semiconductor device manufacturing, exemplify the innovative spirit that drives technological advancement. His contributions are invaluable in improving industry standards and fostering ongoing research in related fields.