Iwate, Japan

Katsuhiko Oyama

USPTO Granted Patents = 9 

Average Co-Inventor Count = 2.3

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Tokyo-To, JP (2006)
  • Oshu, JP (2011 - 2017)
  • Iwate, JP (2015 - 2019)

Company Filing History:


Years Active: 2006-2019

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9 patents (USPTO):Explore Patents

Title: Innovations of Katsuhiko Oyama

Introduction

Katsuhiko Oyama is a prominent inventor based in Iwate, Japan. He has made significant contributions to the field of film deposition technology, holding a total of 9 patents. His work focuses on developing advanced methods and apparatuses for film deposition, which are crucial in various manufacturing processes.

Latest Patents

One of his latest patents is a film deposition apparatus designed for sequentially supplying reaction gases into a chamber to deposit a film on a substrate. This apparatus features a turntable that is rotatable and includes a concave portion on its upper surface. The design incorporates a substrate supporting member that can be attached and detached from the concave portion, along with a drive mechanism that moves the turntable up and down while allowing it to revolve. Another notable patent is a method for managing the atmosphere in a storage container within a processing apparatus. This method involves substituting the internal atmosphere of the storage container with inert gas, ensuring optimal conditions for non-processed substrates.

Career Highlights

Katsuhiko Oyama is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative work has contributed to the advancement of technologies that enhance the efficiency and effectiveness of film deposition processes.

Collaborations

Throughout his career, Oyama has collaborated with notable colleagues, including Yasushi Takeuchi and Kiichi Takahashi. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Katsuhiko Oyama's contributions to the field of film deposition technology are noteworthy and impactful. His innovative patents and collaborations reflect his dedication to advancing the industry. His work continues to influence the development of new technologies in semiconductor manufacturing.

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