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For the Inventor, By the Inventor

Iwate, Japan

Katsuhiko Oyama

This inventor holds 9 USPTO granted patents and 3 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2006-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsuhiko Oyama. Retrieved from https://idiyas.com/inventor/katsuhiko-oyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9 

% Patents Active = 88.9

Average Co-Inventor Count = 2.3

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Tokyo-To, JP (2006)
  • Oshu, JP (2011 - 2017)
  • Iwate, JP (2015 - 2019)

Company Filing History:

goldMedal9 out of 10,904 
 
Tokyo Electron Limited
 patents

Years Active: 2006-2019

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9 patents (USPTO):Explore Patents
1. 10428425 - Film deposition apparatus, method of depositing film, and non-transitory computer-readable recording medium (2019-10-01),
2. 10096504 - Method for managing atmosphere in storage container (2018-10-09),
3. 9679794 - Spacer, spacer transferring method, processing method and processing apparatus (2017-06-13),
4. 9406537 - Cover opening/closing apparatus, thermal processing apparatus using the same, and cover opening/closing method (2016-08-02),
5. 9368384 - Substrate conveying method, recording medium in which program is recorded for causing substrate conveying method to be executed, and substrate conveyor (2016-06-14),
6. 9136152 - Substrate transport apparatus, substrate transport method, and recording medium (2015-09-15),
7. 9048273 - Substrate conveying container opening/closing device, lid opening/closing device and semiconductor manufacturing apparatus (2015-06-02),
8. 7905700 - Vertical-type heat processing apparatus and method of controlling transfer mechanism in vertical-type heat processing apparatus (2011-03-15),
9. 7073999 - Receiving container body for object to be processed (2006-07-11),

Title: Innovations of Katsuhiko Oyama

Introduction

Katsuhiko Oyama is a prominent inventor based in Iwate, Japan. He has made significant contributions to the field of film deposition technology, holding a total of 9 patents. His work focuses on developing advanced methods and apparatuses for film deposition, which are crucial in various manufacturing processes.

Latest Patents

One of his latest patents is a film deposition apparatus designed for sequentially supplying reaction gases into a chamber to deposit a film on a substrate. This apparatus features a turntable that is rotatable and includes a concave portion on its upper surface. The design incorporates a substrate supporting member that can be attached and detached from the concave portion, along with a drive mechanism that moves the turntable up and down while allowing it to revolve. Another notable patent is a method for managing the atmosphere in a storage container within a processing apparatus. This method involves substituting the internal atmosphere of the storage container with inert gas, ensuring optimal conditions for non-processed substrates.

Career Highlights

Katsuhiko Oyama is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative work has contributed to the advancement of technologies that enhance the efficiency and effectiveness of film deposition processes.

Collaborations

Throughout his career, Oyama has collaborated with notable colleagues, including Yasushi Takeuchi and Kiichi Takahashi. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Katsuhiko Oyama's contributions to the field of film deposition technology are noteworthy and impactful. His innovative patents and collaborations reflect his dedication to advancing the industry. His work continues to influence the development of new technologies in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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