Company Filing History:
Years Active: 1994-1998
Title: Inventor Katsuhiko Iizuka: Innovations in Semiconductor Technology
Introduction
Katsuhiko Iizuka, a distinguished inventor based in Kawasaki, Japan, has made significant contributions to the field of semiconductor technology. With a total of four patents to his name, his innovative processes have enhanced the efficiency and effectiveness of semiconductor device fabrication.
Latest Patents
Among his notable inventions, Iizuka holds patents for two groundbreaking processes. The first is a "Process for the Etching of Polycide Film," which involves a dry etching method that improves dimensional controllability and selectivity without the use of fluorine gas. This method employs a double-layer film of polycrystal silicon and metal silicide, activating etching gases through plasma discharge while maintaining a substrate temperature of 60°C or higher.
His second patent, "Process for Preparation of Semiconductor Device," details a technique that utilizes a mask including an organic film to form vertical patterns on a laminated film of metal silicide and non-single crystalline silicon. This method enhances etching rate uniformity and minimizes loose particle occurrence, thereby improving the overall quality of semiconductor devices.
Career Highlights
Katsuhiko Iizuka is affiliated with Fujitsu Corporation, where he actively contributes to advancing semiconductor technologies. His work epitomizes the blend of innovative engineering and practical applications, allowing Fujitsu to maintain its competitive edge in the semiconductor industry.
Collaborations
Iizuka has worked closely with colleagues such as Moritaka Nakamura and Takashi Kurimoto. Their collaborative efforts have yielded cutting-edge technologies that push the boundaries of semiconductor manufacturing.
Conclusion
In conclusion, Katsuhiko Iizuka's innovative spirit and dedication to the field of semiconductor technology are reflected in his patents and contributions at Fujitsu Corporation. As advancements in this field continue to evolve, Iizuka's work remains pivotal in shaping the future of semiconductor devices.