This inventor holds 1 USPTO granted patent. Top assignee: Nippon Telegraph and Telephone Corporation. Active years: 1992.
Company Filing History:
Years Active: 1992
Title: Katsuhide Onose: Innovator in Photosensitive Resin Technology
Introduction
Katsuhide Onose is a notable inventor based in Mito, Japan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive resin compositions. His work has implications for various applications, including semiconductor manufacturing and photolithography.
Latest Patents
Katsuhide Onose holds a patent for a "Photosensitive and high energy beam sensitive resin composition." This invention provides a resin composition that can be utilized as a resist material for forming both positive and negative patterns. The composition includes a substituted polysiloxane with a main polysiloxane chain and a hydrophilic substituent. The resin is designed to be sensitive to high-energy beams such as electron beams, X-rays, and deep ultraviolet rays. It also exhibits excellent resistance to oxygen plasma and other plasmas used in reactive ion etching. The composition can be enhanced with various photosensitive agents, sensitizers, and dissolution inhibitors to improve its properties.
Career Highlights
Katsuhide Onose is associated with Nippon Telegraph and Telephone Corporation, where he has been involved in innovative research and development. His work has led to advancements in materials that are crucial for modern technology.
Collaborations
Throughout his career, Katsuhide Onose has collaborated with esteemed colleagues such as Saburo Imamura and Akinobu Tanaka. These collaborations have contributed to the success and impact of his inventions.
Conclusion
Katsuhide Onose's contributions to the field of photosensitive resin technology highlight his role as an influential inventor. His patented innovations continue to shape advancements in various high-tech industries.