Tokyo, Japan

Katsuaki Ishimaru

This inventor holds 2 USPTO granted patents. Top assignee: Nikon Corporation. Active years: 2000-2003.


% Patents Active = 50.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 53(Granted Patents)


Location History:

  • Kawasaki, JP (2000)
  • Tokyo, JP (2003)

Company Filing History:


Years Active: 2000-2003

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2 patents (USPTO):Explore Patents

Title: Katsuaki Ishimaru: Innovator in Exposure Technology

Introduction

Katsuaki Ishimaru is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of exposure technology, particularly in the development of apparatuses used in the production of microdevices. With a total of 2 patents to his name, Ishimaru's work has had a notable impact on the industry.

Latest Patents

Ishimaru's latest patents include innovative technologies such as an exposure apparatus and a substrate adjuster. The exposure apparatus is designed to expose substrates for the production of working reticles through a master reticle that features a formed pattern. This apparatus is equipped with three support members that hold the substrate horizontally at three locations outside the illuminated areas, which include the pattern area, alignment mark areas, and information mark areas.

His second patent focuses on a substrate adjuster and substrate holder method. This invention addresses the challenges posed by using relatively thin substrates, such as silicon wafers, in exposure apparatuses. The substrate adjuster is inserted between the thin substrate and the substrate holder to elevate the top surface of the wafer. The design allows for the use of different substrate thicknesses without the need to exchange the substrate holder, enhancing the versatility of the exposure apparatus.

Career Highlights

Katsuaki Ishimaru is currently employed at Nikon Corporation, a leading company in imaging and optical products. His work at Nikon has allowed him to push the boundaries of exposure technology, contributing to advancements that benefit the microdevice manufacturing industry.

Collaborations

Ishimaru has collaborated with notable colleagues, including Takashi Masuyuki and Nobuyuki Irie. These partnerships have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Katsuaki Ishimaru's contributions to exposure technology through his patents and work at Nikon Corporation highlight his role as a key innovator in the field. His inventions continue to influence the production of microdevices, showcasing the importance of innovation in advancing technology.

Profile summary based on public USPTO records.
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