Toyoda, Japan

Kathuhiko Nishiwaki

This inventor holds 1 USPTO granted patent. Top assignee: Citizen Watch Company, Ltd.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kathuhiko Nishiwaki. Retrieved from https://idiyas.com/inventor/kathuhiko-nishiwaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Kathuhiko Nishiwaki: Innovator in Dry Etching Technology

Introduction

Kathuhiko Nishiwaki is a notable inventor based in Toyoda, Japan. He is recognized for his contributions to the field of dry etching technology, which is essential in various manufacturing processes, particularly in the semiconductor industry. His innovative approach has led to the development of a unique method that enhances the efficiency and precision of etching processes.

Latest Patents

Nishiwaki holds a patent for a "Method of Dry Etching." This patent describes a dry etching method that utilizes electron cyclotron resonance excited by microwaves. The method is divided into at least two steps: a first etching step that targets a region near the boundary between the non-etching layer and the etching layer, and a second etching step that follows. The process allows for the adjustment of at least one of four control factors—output power of the magnetron, electron cyclotron resonance point, etching pressure, and magnetic field intensity distribution—between the two etching steps. This innovation is crucial for achieving desired etching results while maintaining the integrity of the non-etching layer.

Career Highlights

Nishiwaki is currently employed at Citizen Watch Company, Ltd., where he applies his expertise in etching technology. His work has significantly contributed to the advancement of manufacturing techniques within the company. His dedication to innovation has positioned him as a key figure in the development of new technologies in the industry.

Collaborations

Nishiwaki collaborates with Toru Takizawa, who is also involved in the field of etching technology. Their partnership has fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge solutions.

Conclusion

Kathuhiko Nishiwaki's contributions to dry etching technology exemplify the impact of innovative thinking in the manufacturing sector. His patented methods and collaborative efforts continue to influence advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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