Kathryn J Berg

Title: Kathryn J Berg: Innovator in Electrical Via Structures

Introduction

Kathryn J Berg is a notable inventor based in Long Beach, CA (US). She has made significant contributions to the field of electrical engineering, particularly in the development of methods for forming electrical via structures. Her innovative approach has led to advancements in the manufacturing processes of electronic components.

Latest Patents

Kathryn holds a patent for a "Method of forming an electrical via structure." This patent describes a process where a via is formed through a dielectric layer that separates two conductive layers. The method involves establishing a laterally erodible mask over the dielectric, with a window positioned over the desired via location. The simultaneous erosion of the mask and exposed dielectric material is achieved through reactive ion etching, resulting in a tapered via that enhances the uniformity of the upper metallization.

Career Highlights

Kathryn has worked at Hughes Aircraft Company, where she has applied her expertise in electrical engineering to develop innovative solutions. Her work has been instrumental in improving the reliability and efficiency of electronic devices.

Collaborations

Throughout her career, Kathryn has collaborated with notable colleagues, including Philip A Trask and Kirk R Osborne. These collaborations have fostered a creative environment that has led to the successful development of new technologies.

Conclusion

Kathryn J Berg's contributions to the field of electrical engineering, particularly through her patented methods, highlight her role as an influential inventor. Her work continues to impact the industry positively, paving the way for future innovations in electronic manufacturing.