Vestal, NY, United States of America

Kathleen Lorraine Covert

This inventor holds 4 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1996-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kathleen Lorraine Covert. Retrieved from https://idiyas.com/inventor/kathleen-lorraine-covert

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 13(Granted Patents)


Location History:

  • Vestal, NY (US) (1996 - 1999)
  • Binghamton, NY (US) (2003)

Company Filing History:


Years Active: 1996-2003

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4 patents (USPTO):Explore Patents

Title: Innovations by Kathleen Lorraine Covert

Introduction

Kathleen Lorraine Covert is a notable inventor based in Vestal, NY (US). She has made significant contributions to the field of circuit board technology, holding a total of 4 patents. Her work focuses on innovative methods for producing fine-line circuit boards and etching nickel/iron alloys.

Latest Patents

One of her latest patents is a method of producing fine-line circuit boards using chemical polishing. This invention involves patterning a resist layer according to a circuit mask that defines desired circuit paths. The process includes removing the resist from the board in the desired circuit paths and plating a conductive material onto the board in the resist voids defined by the circuit mask. The height of the conductive material is carefully controlled relative to the substrate, and a low-reactive solution is applied to remove a surface portion of the conductive material. This innovative approach allows for precise control over the height of the conductive material, ultimately leading to a finished product using conventional circuit board fabrication techniques.

Another significant patent by Covert is related to the selective etching of nickel/iron alloys. This invention provides a novel method of etching nickel/iron alloy using a unique etchant that does not affect copper. The etchant comprises an aqueous solution of ferric ammonium sulfate and an acid selected from sulfuric acid, phosphoric acid, or mixtures thereof. This method represents a significant advancement in the etching process for these alloys.

Career Highlights

Kathleen Covert has built her career at International Business Machines Corporation (IBM), where she has been able to apply her innovative ideas and technical expertise. Her work has contributed to advancements in circuit board technology, making her a valuable asset to her organization.

Collaborations

Throughout her career, Covert has collaborated with talented individuals such as Lisa Jeanine Jimarez and Krystyna Waleria Semkow. These collaborations have likely fostered an environment of innovation and creativity, leading to the development of her impactful patents.

Conclusion

Kathleen Lorraine Covert's contributions to the field of circuit board technology through her patents demonstrate her innovative spirit and technical prowess. Her work continues to influence advancements in the industry, showcasing the importance of creativity in engineering and technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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