Company Filing History:
Years Active: 2000-2001
Title: Innovations by Kathleen H Martinek
Introduction
Kathleen H Martinek is a notable inventor based in Newburgh, NY (US). She has made significant contributions to the field of photoresist systems and processes, holding 2 patents to her name. Her work focuses on enhancing lithographic patterns and improving photo acid generator compounds.
Latest Patents
One of her latest patents is titled "Photoresist system and process for aerial image enhancement." This invention describes a method to improve the resolution of lithographic patterns using a double exposure process. The resist layer is subjected to a patternwise first exposure followed by a blanket second exposure. The resist composition includes a chemically amplified resist that undergoes significant shrinkage upon exposure to radiation, as well as a photo-bleachable component.
Another significant patent is "Photo acid generator compounds, photo resists, and method for improving." This invention provides several mid UV photo acid generators (PAGs) and a chemically amplified photo resist (CAMP). The method aims to improve nested to isolated line bias and enhance photo speed. Unlike conventional mid UV PAGs, her invention does not require a mid UV sensitizer. The PAGs can be sulfonium or iodonium salts, suitable for use in a chemically amplified photo resist with a photo speed of 500 mJ/cm² or less.
Career Highlights
Kathleen is currently employed at International Business Machines Corporation (IBM), where she continues to innovate in her field. Her work has contributed to advancements in lithography and photoresist technology, making her a valuable asset to her organization.
Collaborations
She has collaborated with notable coworkers, including Wu-Song S Huang and Ahmad D Katnani, further enhancing her research and development efforts.
Conclusion
Kathleen H Martinek's contributions to the field of photoresist systems and processes highlight her innovative spirit and dedication to advancing technology. Her patents reflect her expertise and commitment to improving lithographic techniques.
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