Marlborough, CT, United States of America

Kathleen Daudish

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: United Technologies Corporation. Active years: 2018.


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Kathleen Daudish: Innovator in Airfoil Material Removal

Introduction

Kathleen Daudish is a notable inventor based in Marlborough, CT (US). She has made significant contributions to the field of engineering, particularly in the area of airfoil material removal. Her innovative approach has led to the development of a unique fixture system that enhances the efficiency and safety of material removal operations.

Latest Patents

Kathleen holds 1 patent for her invention titled "Fixture system and method for securing an airfoil during material removal operations." This patent describes a method that involves engaging the root of the airfoil within a root-securing fixture and the tip of the airfoil within a tip-securing fixture. The process allows for the effective removal of material from the airfoil while ensuring that the tip can be disengaged and reengaged in a free-state position, facilitating further material removal.

Career Highlights

Kathleen is currently employed at United Technologies Corporation, where she applies her expertise in engineering and innovation. Her work has been instrumental in advancing the methodologies used in airfoil manufacturing and maintenance.

Collaborations

Throughout her career, Kathleen has collaborated with talented individuals such as Thomas J Horn and Micah Beckman. These partnerships have fostered a creative environment that encourages the development of cutting-edge solutions in the aerospace industry.

Conclusion

Kathleen Daudish exemplifies the spirit of innovation in engineering through her contributions to airfoil material removal techniques. Her patent and work at United Technologies Corporation highlight her commitment to advancing technology in this critical field.

Profile summary based on public USPTO records.
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