Kathleen A Perry

Title: Innovations by Kathleen A. Perry: Contributions to Semiconductor Processing

Introduction

Kathleen A. Perry, a distinguished inventor based in Lagrangeville, NY, has made significant strides in the field of semiconductor processing. With a total of three patents to her name, her work focuses on advanced deposition methods that enhance the quality and efficiency of metal and insulator films. Her innovative techniques are recognized for their potential to revolutionize industry standards.

Latest Patents

Kathleen's latest patents reflect her commitment to innovation in semiconductor technology. One of her notable inventions is the "Deposition Method for High Aspect Ratio Features Using Photoablation." This methodology involves a laser ablation system that enables superior fill of high aspect ratio features in semiconductor processing. By ablating target materials that are propelled perpendicular to the target surface, Kathleen's method ensures complete fill with minimal heating of the substrate. Furthermore, it facilitates the deposition of alloys, graded layers, and pure metals in low temperature patterned applications, which has proven effective for isolation structures as well.

Another significant patent by Kathleen is the "Chem-Mech Polishing Method for Producing Coplanar Metal/Insulator Films." This process employs chem-mechanical polishing techniques to create coplanar films on substrates. The approach includes a substrate with a patterned insulating layer, coated with a metal layer. The substrate is polished in a parallel setup where a selective slurry removes metal significantly faster than dielectric material. This process not only enhances the efficiency but also establishes automatic etch stop barriers, thereby improving the overall quality of the film.

Career Highlights

Kathleen A. Perry's career is closely affiliated with the International Business Machines Corporation (IBM), where she has contributed to cutting-edge research and development in semiconductor technologies. Her expertise and innovative spirit have led to the successful application of her patented methods in practical settings, showcasing her impact on the industry.

Collaborations

Throughout her career, Kathleen has collaborated with other esteemed professionals, including her coworkers William L. Guthrie and William J. Patrick. These collaborations have allowed for the exchange of ideas and enhanced innovation in their respective projects, reflecting the importance of teamwork in advancing technology.

Conclusion

Kathleen A. Perry continues to be a prominent figure in semiconductor processing, with a focus on innovative methods that enhance the quality and efficiency of materials used in the industry. Her contributions not only exemplify her ingenuity but also highlight the collaborative effort involved in achieving groundbreaking advancements in technology. As her work progresses, it is anticipated that her inventions will leave a lasting impact on the future of semiconductor manufacturing.