Katharine G Frase

Title: Katharine G Frase: Innovator in Ceramic Technology

Introduction

Katharine G Frase is a prominent inventor based in Peekskill, NY (US). She has made significant contributions to the field of ceramic technology, particularly in applications related to electronic devices. With a total of 2 patents, her work has paved the way for advancements in substrate processing.

Latest Patents

Frase's latest patents include innovative technologies that enhance the performance of ceramic substrates. One of her notable inventions is the "Edge seal technology for low dielectric/porous substrate processing." This patent describes a method for creating a sealed composite ceramic structure, which involves forming a plurality of composite green sheets. These sheets consist of a central portion of partially densifiable material and an outer portion of fully densifiable material. The process results in a laminated structure that is sintered to form a sealed ceramic body with significant advantages for semiconductor devices and fluid processing applications. Another patent focuses on "Large ceramic articles and method of manufacturing," which details the fabrication of large ceramic substrate articles for electronic applications.

Career Highlights

Katharine G Frase is currently employed at International Business Machines Corporation (IBM), where she continues to innovate in the field of ceramic technology. Her work has been instrumental in developing materials that meet the demands of modern electronic applications.

Collaborations

Throughout her career, Frase has collaborated with notable colleagues, including Govindarajan Natarajan and Takeshi Takamori. These partnerships have contributed to her success and the advancement of her research.

Conclusion

Katharine G Frase is a trailblazer in ceramic technology, with a focus on enhancing substrate processing for electronic applications. Her innovative patents and contributions to IBM highlight her role as a leading inventor in her field.