Bengaluru, India

Kashyap Subramanya

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Lam Research Corporation. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kashyap Subramanya. Retrieved from https://idiyas.com/inventor/kashyap-subramanya-qqs3rxds

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Kashyap Subramanya: Innovator in Substrate Processing Systems

Introduction

Kashyap Subramanya is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of substrate processing systems, showcasing his innovative spirit and technical expertise. His work has led to the development of a unique patent that enhances the efficiency of showerheads used in these systems.

Latest Patents

Kashyap holds a patent for a "Showerhead for a substrate processing system." This invention is designed to improve the performance and reliability of substrate processing, which is crucial in various manufacturing processes.

Career Highlights

Kashyap Subramanya is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His role at Lam Research allows him to apply his innovative ideas and contribute to advancements in technology.

Collaborations

Throughout his career, Kashyap has collaborated with talented individuals such as Eli Jeon and Daniel Boatright. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Kashyap Subramanya is a dedicated inventor whose work in substrate processing systems exemplifies innovation and technical prowess. His contributions continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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