This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 2020.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020
Title: Karthik P Hariharan: Innovator in Cognitive Analysis of Apparel Images
Introduction
Karthik P Hariharan is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of cognitive analysis and classification of apparel images. With a total of 2 patents to his name, Karthik is recognized for his innovative approaches in utilizing convolutional neural networks (CNNs) for image processing.
Latest Patents
Karthik's latest patents focus on the cognitive analysis and classification of apparel images. The disclosed method involves generating f-scores for apparel items by identifying training images associated with various attributes. A first convolutional neural network (CNN) is trained using these images and attributes. The CNN is refined iteratively by removing specific neurons and retraining based on the respective attributes. Once the CNN is fully trained, additional CNNs are generated to process incoming images of apparel items, ultimately determining an f-score based on the output.
Career Highlights
Karthik is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM emphasizes the application of advanced machine learning techniques in the fashion industry. His innovative contributions have positioned him as a key player in the intersection of technology and apparel.
Collaborations
Karthik collaborates with talented individuals such as Mohit Sewak and Irina Fedulova. Their combined expertise fosters a creative environment that drives innovation in their projects.
Conclusion
Karthik P Hariharan is a distinguished inventor whose work in cognitive analysis and classification of apparel images showcases the potential of machine learning in the fashion industry. His contributions continue to influence the field and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
