Hochstadt, Germany

Karlheinz Muss

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Ruag Ammotec Gmbh. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Karlheinz Muss. Retrieved from https://idiyas.com/inventor/karlheinz-muss

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: The Innovations of Karlheinz Muss

Introduction

Karlheinz Muss is a notable inventor based in Höchstadt, Germany. He has made significant contributions to the field of projectile design, particularly in optimizing their performance. His innovative approach focuses on reducing air resistance and enhancing precision in projectile technology.

Latest Patents

Karlheinz Muss holds a patent for the "Structuring of the ogive surface of a projectile." This invention relates to a projectile with a tip at the front, which transitions into an ogive and then into a rear cylindrical area. The patent proposes that structuring the surface of the ogive can effectively reduce air resistance and improve the accuracy of the projectile.

Career Highlights

Muss is associated with Ruag Ammotec GmbH, a company known for its expertise in ammunition and defense technology. His work at the company has allowed him to apply his innovative ideas in practical applications, contributing to advancements in the field.

Collaborations

Throughout his career, Karlheinz Muss has collaborated with talented individuals such as Hannes Dikhoff and Vasile Papet. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Karlheinz Muss exemplifies the spirit of innovation in projectile design, with his patent showcasing a unique approach to enhancing performance. His contributions continue to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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