Novi, MI, United States of America

Karl R Loehr

This inventor holds 13 USPTO granted patents, plus 1 CIPO patent. Top assignee: Ekstrom Industries, Inc.. Active years: 1995-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Karl R Loehr. Retrieved from https://idiyas.com/inventor/karl-r-loehr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 84.6


Average Co-Inventor Count = 3.1

ph-index = 11

Forward Citations = 295(Granted Patents)


Location History:

  • Novi, MI (US) (1995 - 2001)
  • Commerce Township, MI (US) (2004 - 2008)

Company Filing History:


Years Active: 1995-2008

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13 patents (USPTO):Explore Patents

Title: Karl R Loehr - Pioneering Inventor from Novi, MI

Introduction: Karl R Loehr is a distinguished inventor hailing from Novi, Michigan. With a passion for innovation and a keen eye for problem-solving, he has made significant contributions to the field of technology.

Latest Patents: Karl R Loehr holds several patents in various technological domains, showcasing his versatility and creativity in inventing cutting-edge solutions to complex challenges.

Career Highlights: Throughout his illustrious career, Karl R Loehr has been recognized for his groundbreaking inventions that have revolutionized industries. His commitment to pushing the boundaries of technology has earned him a reputation as a visionary inventor.

Collaborations: Karl R Loehr has collaborated with leading tech companies and research institutions to bring his inventions to life. His ability to work effectively in multidisciplinary teams has led to the successful development and implementation of innovative technologies.

Conclusion: Karl R Loehr's relentless pursuit of innovation and his remarkable contributions to the world of technology make him a true pioneer in the field of inventing. His legacy continues to inspire future generations of inventors to think boldly and create solutions that shape the future.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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