Company Filing History:
Years Active: 1978-1988
Title: The Innovations of Karl H Neisius
Introduction
Karl H Neisius is a notable inventor based in Darmstadt, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving processes related to photoresist materials, which are crucial in the manufacturing of electronic components.
Latest Patents
One of his latest patents is titled "Agent and method for the removal of photoresist and stripper residues." This invention provides a solution for rapidly and completely removing photoresist and stripper residues from semiconductor substrates after the stripping process. The method utilizes an aqueous post-rinsing agent that contains a nonionogenic surfactant and an organic base. Another significant patent is for a negatively operating photoresist composition that includes radiation-absorbing properties. This composition features new aminoazobenzene derivatives, which enhance the performance of photoresist materials.
Career Highlights
Karl H Neisius is associated with Merck Patent Gesellschaft mit beschränkter Haftung, a leading company in the pharmaceutical and chemical sectors. His work at Merck has allowed him to develop innovative solutions that address challenges in semiconductor manufacturing.
Collaborations
Throughout his career, Karl has collaborated with esteemed colleagues such as Alois Litters and Wilhelm Baumer. These partnerships have contributed to the advancement of technology in their field.
Conclusion
Karl H Neisius is a prominent figure in the realm of semiconductor technology, with a focus on enhancing photoresist materials. His innovative patents and collaborations reflect his commitment to advancing the industry.