Company Filing History:
1 out of 832,843 Years Active: 2002
Title: Innovator Spotlight: Karine Kenis and His Contributions to Silicon Oxide Growth
Introduction: Karine Kenis, an accomplished inventor based in Kessel-Lo, Belgium, has made significant strides in the field of material science. With a focus on semiconductor technology, he holds a patent that showcases his expertise in growing silicon oxides. This article will delve into Kenis's groundbreaking methods and his contributions to innovation in silicon substrates.
Latest Patents: Karine Kenis is credited with one notable patent titled "Method for growing thin silicon oxides on a silicon substrate using chlorine precursors." This innovative method involves the thermal oxidation of a silicon substrate in a furnace, utilizing a gaseous mixture that includes oxygen and chlorine. The chlorine is generated from an organic chlorine-carbon source, specifically oxalyl chloride. This technique allows for the production of ultra-thin silicon oxides and facilitates substrate cleaning with low oxidation power. The method is particularly effective at temperatures below typical oxidation limits and in environments with minimal oxygen content.
Career Highlights: Throughout his career, Karine Kenis has demonstrated a commitment to advancing semiconductor technology. His unique approach to growing silicon oxides showcases his creativity and technical skills, contributing to potential applications across various industries. The patent he holds reflects his commitment to research and innovation in the field.
Collaborations: Karine works closely with esteemed colleagues, including Paul Mertens and Michael McGeary. Their collaborative efforts contribute to a dynamic research environment, driving forward the boundaries of material science and semiconductor applications. Together, they aim to push the envelope of what is possible in silicon substrate technology.
Conclusion: Karine Kenis stands as a prominent figure in the field of innovations related to silicon technologies, with a patent that highlights his ability to combine creativity and technical knowledge. His work not only has implications for semiconductor manufacturing but also paves the way for future developments in the industry. As innovations continue to evolve, inventors like Kenis will be key players in shaping the future of technology.