Karin Homann

Title: Innovations of Karin Homann in Scratch-Resistant Coatings

Introduction

Karin Homann is a notable inventor based in Steinfurt, Germany. She has made significant contributions to the field of materials science, particularly in the development of scratch-resistant coatings for polycarbonate substrates. With a total of two patents to her name, her work has implications for various industries, including electronics.

Latest Patents

Karin's latest patents focus on the creation of scratch-resistant-coated polycarbonates with high transparency. The first patent describes a process for coating polycarbonate substrates using a transparent coating composition that includes a radiation-curing binder resin, nanoparticles, and light stabilizers. This innovative process enhances the durability and clarity of polycarbonate materials. The second patent outlines a method for applying a transparent coating composition to plastic substrates, which includes specific weight percentages of various urethane (meth)acrylates and compounds. This method aims to produce plastic substrates with a high degree of transparency and scratch resistance, making them ideal for use in electronic device housings.

Career Highlights

Karin Homann is currently employed at BASF Coatings GmbH, where she continues to advance her research in coating technologies. Her work has been instrumental in developing products that meet the demands of modern applications, particularly in the electronics sector.

Collaborations

Karin collaborates with talented colleagues, including Stefanie Schroeder and Andre Brosseit. Their combined expertise contributes to the innovative projects at BASF Coatings GmbH.

Conclusion

Karin Homann's contributions to the field of scratch-resistant coatings exemplify the importance of innovation in materials science. Her patents not only enhance the functionality of polycarbonate substrates but also pave the way for advancements in various applications.