Company Filing History:
Years Active: 2007
Title: Karen Greig - Innovator in Silicon Oxide Film Technology
Introduction
Karen Greig is a prominent inventor based in Santa Clara, CA (US). She has made significant contributions to the field of semiconductor technology, particularly in the area of silicon oxide film deposition. Her innovative work has led to the development of a patented method that enhances the gapfill process in high-density plasma chemical vapor deposition (HDP-CVD).
Latest Patents
Karen holds a patent for "Oxygen plasma treatment for enhanced HDP-CVD gapfill." This patent describes methods for depositing a silicon oxide film on a substrate within a processing chamber. The process involves flowing a gas mixture containing silicon, oxygen, and a fluent gas into the chamber, where a plasma is formed to deposit the silicon oxide film. The method ensures that the film effectively fills gaps between adjacent raised surfaces, which is crucial for advanced semiconductor manufacturing. She has 1 patent to her name.
Career Highlights
Karen Greig is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. Her work at Applied Materials has positioned her as a key player in the development of innovative technologies that drive the industry forward.
Collaborations
Throughout her career, Karen has collaborated with notable colleagues, including Hemant P Mungekar and Young Seen Lee. These collaborations have further enhanced her research and development efforts in semiconductor technology.
Conclusion
Karen Greig's contributions to the field of semiconductor technology, particularly through her patented methods for silicon oxide film deposition, highlight her role as an influential inventor. Her work continues to impact the industry positively, paving the way for advancements in semiconductor manufacturing.