Ebina, Japan

Kaoru Shida

This inventor holds 1 USPTO granted patent. Top assignee: Fuji Xerox Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kaoru Shida. Retrieved from https://idiyas.com/inventor/kaoru-shida

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2010

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Kaoru Shida

Introduction

Kaoru Shida is a notable inventor based in Ebina, Japan. He has made significant contributions to the field of electronic components, particularly through his innovative patents. His work has been instrumental in advancing technology in various applications.

Latest Patents

Kaoru Shida holds a patent for an electronic component, laser device, optical writing device, and image forming apparatus. This patent describes an electronic component that includes a base and a seal body fixed to the base, creating a hermetically sealed space. The electronic component main body is attached to a metal substrate via an adhesive containing silver within this sealed space. Notably, the base features a nickel-plated layer that does not contain phosphor on the seal body side.

Career Highlights

Shida is currently employed at Fuji Xerox Co., Ltd., where he continues to innovate and develop new technologies. His work has garnered attention for its practical applications in the electronics industry.

Collaborations

Throughout his career, Kaoru Shida has collaborated with esteemed colleagues such as Eiichi Nagatsuka and Yasumasa Asaya. These partnerships have contributed to the success of his projects and the advancement of technology in their field.

Conclusion

Kaoru Shida's contributions to electronic components and his innovative patents highlight his role as a significant figure in technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…