Kao-Mei Sung

Title: Kao-Mei Sung: Innovator in Epitaxial Substrates

Introduction

Kao-Mei Sung is a prominent inventor based in Taoyuan, Taiwan. She has made significant contributions to the field of materials science, particularly in the development of epitaxial substrates. With a total of 2 patents, her work focuses on enhancing the performance and efficiency of electronic devices.

Latest Patents

Kao-Mei Sung's latest patents include innovative technologies such as an epitaxial substrate featuring a 2D material interposer. This substrate is designed to extend along an epitaxial interface direction and consists of a polycrystalline base substrate with a superficial layer, wafer bevel, and back surface. The invention addresses the thermal expansion differences between the polycrystalline base substrate and materials like MN or GaN. Additionally, her patent on encapsulated substrates involves a zinc oxide substrate and a composite barrier layer, which enhances device performance.

Career Highlights

Throughout her career, Kao-Mei Sung has demonstrated a commitment to advancing technology in her field. Her patents reflect her innovative approach to solving complex engineering challenges. She has established herself as a key figure in the development of high-performance materials for electronic applications.

Collaborations

Kao-Mei Sung has collaborated with notable colleagues, including Hsiao-Lei Wang and Neng-Tai Shih. These partnerships have contributed to her success and the advancement of her research.

Conclusion

Kao-Mei Sung's contributions to the field of epitaxial substrates highlight her role as an influential inventor. Her innovative patents and collaborative efforts continue to shape the future of materials science and electronic device technology.