Princeton, NJ, United States of America

Kangjie Lu

This inventor holds 1 USPTO granted patent. Top assignee: Nec Laboratories America, Inc.. Active years: 2016.


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Kangjie Lu: Innovator in Privacy Protection Technologies

Introduction

Kangjie Lu is a notable inventor based in Princeton, NJ (US). He has made significant contributions to the field of application software, particularly in the area of privacy protection. His innovative work focuses on developing systems and methods that enhance user privacy in digital applications.

Latest Patents

Kangjie Lu holds a patent for "Duleak: a scalable app engine for high-impact privacy leaks." This patent outlines systems and methods designed to protect privacy in application software by detecting various forms of application tampering. These include detecting application repacking, identifying information leakage, and recognizing vulnerabilities that could lead to privacy breaches. His work is crucial in addressing the growing concerns surrounding data privacy in the digital age.

Career Highlights

Kangjie Lu is currently employed at NEC Laboratories America, Inc., where he continues to innovate and develop technologies that safeguard user privacy. His expertise in the field has positioned him as a key player in the ongoing efforts to enhance security measures in application software.

Collaborations

Kangjie Lu has collaborated with esteemed colleagues such as Zhichun Li and Zhenyu Wu. Their combined efforts contribute to advancing research and development in privacy protection technologies.

Conclusion

Kangjie Lu's work in developing privacy protection systems is vital in today's technology-driven world. His innovative patent and ongoing contributions at NEC Laboratories America, Inc. highlight his commitment to enhancing user privacy in application software.

Profile summary based on public USPTO records.
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