This inventor holds 4 USPTO granted patents and 7 published patent applications. Top assignees: Korea Advanced Institute of Science and Technology, Lg Cns Co., Ltd., Samsung Electronics Co., Ltd.. Active years: 2005-2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:




Years Active: 2005-2018
Title: Kang Hee Lee: Innovator in Abnormal Pattern Analysis
Introduction
Kang Hee Lee is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of abnormal pattern analysis, holding a total of 4 patents. His work focuses on developing methods and systems that enhance the detection and analysis of abnormal patterns in various applications.
Latest Patents
Kang Hee Lee's latest patents include an "Abnormal Pattern Analysis Method" and an "Abnormal Pattern Analysis Apparatus Performing the Same." This method involves determining a service application related to analysis data, selecting an abnormal pattern analysis module, and performing analysis to detect abnormal patterns. Another notable patent is a "Method and Service Server for Providing Passenger Density Information." This invention includes a motion vector detection unit, a head recognition unit, and a density information generation unit that collectively generate passenger density information based on captured images and sensor data.
Career Highlights
Throughout his career, Kang Hee Lee has worked with esteemed organizations such as the Korea Advanced Institute of Science and Technology and Samsung Electronics Co., Ltd. His experience in these institutions has allowed him to refine his skills and contribute to innovative projects in technology and analysis.
Collaborations
Kang Hee Lee has collaborated with notable colleagues, including Jong Hwan Kim and Shin Yoon Kim. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.
Conclusion
Kang Hee Lee is a distinguished inventor whose work in abnormal pattern analysis has paved the way for advancements in technology. His contributions are significant, and his patents reflect his innovative spirit and dedication to improving analytical methods.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile