Yokohama, Japan

Kanefumi Nakahara


Average Co-Inventor Count = 1.6

ph-index = 5

Forward Citations = 62(Granted Patents)


Location History:

  • Yokohama, JP (1995 - 2002)
  • Tokyo, JP (2002)

Company Filing History:


Years Active: 1995-2002

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7 patents (USPTO):Explore Patents

Title: Kanefumi Nakahara: Innovator in Photomask Technology

Introduction

Kanefumi Nakahara is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of photomask technology, holding a total of 7 patents. His work primarily focuses on the development of advanced apparatuses and methods for the manufacturing and exposure of patterns onto substrates.

Latest Patents

Nakahara's latest patents include innovative designs such as a photomask case and a transporting apparatus and method. The photomask case is specifically designed to accommodate a reticle formed with a pattern intended for transfer to a substrate. This case features one outer wall with first and second depressions, where the first depression is shaped in either a conical or triangular pyramidal form, while the second depression is designed with a V-groove form. Additionally, he has developed a method for manufacturing exposure apparatus and a method for exposing a pattern on a mask onto a substrate. This exposure method involves transferring the mask to a mask stage using a transfer device and ensuring that the device is positioned to avoid hindering the exposure process.

Career Highlights

Kanefumi Nakahara is currently employed at Nikon Corporation, a leading company in imaging and optical products. His role at Nikon has allowed him to further his research and development in photomask technology, contributing to the advancement of the industry.

Collaborations

Throughout his career, Nakahara has collaborated with notable colleagues, including Yutaka Endo and Tsuneaki Orikasa. These collaborations have fostered innovation and have been instrumental in the development of new technologies in the field.

Conclusion

Kanefumi Nakahara's contributions to photomask technology and his innovative patents highlight his importance as an inventor in the industry. His work continues to influence advancements in manufacturing and exposure methods, solidifying his legacy in the field.

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