The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2002

Filed:

Feb. 24, 2000
Applicant:
Inventors:

Shinichi Hirakawa, Tokyo, JP;

Kanefumi Nakahara, Tokyo, JP;

Yutaka Endo, Tokyo, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B25J 1/502 ;
U.S. Cl.
CPC ...
B25J 1/502 ;
Abstract

This mask case is a mask case for accommodating a reticle formed with a pattern to be transferred to a substrate, in which one outer wall face of the mask case is formed with first and second depressions and the form of the first depression is one of conical and triangular pyramidal forms, whereas the second depression has a V-groove form.


Find Patent Forward Citations

Loading…