Kanagawa, Japan

Kana Onoko

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Canon Kabushiki Kaisha. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kana Onoko. Retrieved from https://idiyas.com/inventor/kana-onoko-16l6ov22

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Kana Onoko: Innovator in Semiconductor Technology

Introduction

Kana Onoko is a prominent inventor based in Kanagawa, Japan. She has made significant contributions to the field of semiconductor technology. Her innovative work has led to the development of methods that enhance the manufacturing processes of electronic equipment.

Latest Patents

Kana Onoko holds a patent for a semiconductor module manufacturing method, which includes a detailed process for creating electronic equipment. The patent describes a chip component that features a first electrode and a second electrode, along with a semiconductor device that includes a first land and a second land. The process involves supplying a first solder paste and a second solder paste to a printed wiring board. The chip component is then placed on the board, ensuring that the electrodes are in contact with the respective solder pastes. The semiconductor device is positioned so that the lands align with the electrodes. The solder paste is subsequently heated and melted, bonding the components together effectively.

Career Highlights

Kana Onoko is currently associated with Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. Her role at Canon has allowed her to apply her expertise in semiconductor technology to develop innovative solutions that meet the demands of modern electronic devices.

Conclusion

Kana Onoko's contributions to semiconductor technology exemplify her dedication to innovation and excellence in her field. Her patent reflects her ability to create efficient manufacturing methods that advance electronic equipment production.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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