This inventor holds 1 USPTO granted patent. Top assignee: Novellus Systems Incorporated. Active years: 2008.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2008
Title: The Innovations of Kan Quan Vo
Introduction
Kan Quan Vo is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of electronic device fabrication, particularly in the area of semiconductor manufacturing. His innovative approach has led to advancements that improve the efficiency and quality of electronic devices.
Latest Patents
Kan Quan Vo holds a patent for his invention titled "Resolving of fluorine loading effect in the vacuum chamber." This invention addresses challenges in electronic device fabrication processes, specifically for making semiconductor wafers. The patent focuses on minimizing the fluorine loading effect in the reaction chamber of a High-Density Plasma Chemical Vapor Deposition (HDP CVD) apparatus. By employing a method that utilizes hydrogen plasma treatment of the chamber and substrate, Vo's invention significantly reduces deposition thickness variations on wafers. The process involves treating the chamber with an etchant gas and repeating the hydrogen gas introduction after etching, ensuring consistent fabrication results.
Career Highlights
Kan Quan Vo is currently employed at Novellus Systems Incorporated, a company known for its innovative solutions in semiconductor manufacturing. His work at Novellus has allowed him to apply his expertise in developing advanced fabrication techniques that enhance the performance of electronic devices.
Collaborations
Throughout his career, Kan Quan Vo has collaborated with notable colleagues, including Chi-I Lang and Ratsamee Limdulpaiboon. These collaborations have contributed to the advancement of technologies in the semiconductor industry.
Conclusion
Kan Quan Vo's contributions to the field of electronic device fabrication exemplify the impact of innovative thinking in technology. His patent addressing the fluorine loading effect showcases his commitment to improving manufacturing processes. Through his work at Novellus Systems Incorporated and collaborations with fellow professionals, Vo continues to influence the semiconductor industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
