Company Filing History:
Years Active: 2021
Title: Inventor Kan-Heng Lee: Innovations in Transition Metal Chalcogenide Films
Introduction
Kan-Heng Lee is a prominent inventor located in Chicago, IL, renowned for his groundbreaking work in materials science. With a focus on transition metal chalcogenides (TMDs), he has contributed significantly to the development of van der Waals (VDW) films, which hold promise in various technological applications.
Latest Patents
Kan-Heng Lee holds a patent titled "Transition Metal Chalcogenide Van der Waals Films, Methods of Making Same, and Apparatuses and Devices Comprising Same." This patent reveals innovative methods for creating VDW films that incorporate one or more TMD films. His approach involves the transfer of monolayer TMD films under vacuum, utilizing a handle layer, and outlines various apparatuses and devices that utilize these advanced films.
Career Highlights
Currently, Kan-Heng Lee is affiliated with Cornell University, where he engages in cutting-edge research and development. His contributions to the field of materials science are underscored by his singular patent and ongoing research initiatives aimed at further exploration of TMDs and their applications.
Collaborations
Throughout his career, Kan-Heng Lee has collaborated with esteemed colleagues such as Jiwoong Park and Kibum Kang. These partnerships have facilitated a deeper understanding of van der Waals materials and have likely driven further innovations in the field.
Conclusion
Kan-Heng Lee exemplifies the innovative spirit of modern inventors, pushing the boundaries of material science with his focus on transition metal chalcogenides. His work at Cornell University and his singular patent reflect a commitment to advancing technology and the potential applications of van der Waals films. As the field continues to evolve, his contributions will undoubtedly play a crucial role in shaping future advancements.