The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2021
Filed:
Jul. 10, 2017
Applicant:
Cornell University, Ithaca, NY (US);
Inventors:
Jiwoong Park, Chicago, IL (US);
Kibum Kang, Chicago, IL (US);
Hui Gao, Brooklyn, NY (US);
Saien Xie, Chicago, IL (US);
Kan-Heng Lee, Chicago, IL (US);
Assignee:
CORNELL UNIVERSITY, Ithaca, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/40 (2006.01); H01L 29/08 (2006.01); H01L 29/88 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/88 (2013.01); H01L 21/02568 (2013.01);
Abstract
Provided are van der Waals (VDW) films comprising one or more transition metal chalcogenide (TMD) films. Also provided are methods of making VDW films. The methods are based on transfer of monolayer TMD films under vacuum, for example, using a handle layer. Also provided are apparatuses and devices comprising one or more VDW film.