Hong Kong, China

Kam Lun Tailun Gates Sham

This inventor holds 2 USPTO granted patents. Top assignee: One World Technologies, Inc.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kam Lun Tailun Gates Sham. Retrieved from https://idiyas.com/inventor/kam-lun-tailun-gates-sham

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 2005

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2 patents (USPTO):Explore Patents

Title: The Innovations of Kam Lun Tailun Gates Sham

Introduction

Kam Lun Tailun Gates Sham is a notable inventor based in Hong Kong, CN. He has made significant contributions to the field of technology, holding a total of 2 patents. His work reflects a commitment to innovation and advancement in his industry.

Latest Patents

Among his latest inventions is a circular saw, which showcases his expertise in creating practical tools for various applications. This invention is a testament to his ability to combine functionality with cutting-edge design.

Career Highlights

Kam Lun Tailun Gates Sham is currently employed at One World Technologies, Inc. His role at the company allows him to further develop his ideas and bring new inventions to life. His dedication to his work has positioned him as a valuable asset in the field of technology.

Collaborations

He collaborates with talented individuals, including his coworker Daniel Alex Chunn. Together, they work on innovative projects that push the boundaries of technology and design.

Conclusion

Kam Lun Tailun Gates Sham is an influential inventor whose work continues to impact the industry positively. His contributions, particularly in the realm of practical tools, highlight his innovative spirit and dedication to advancement.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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