Kalpana Suen

Title: Kalpana Suen: Innovator in Semiconductor Processing

Introduction

Kalpana Suen is a prominent inventor based in San Jose, CA (US). She has made significant contributions to the field of semiconductor processing, particularly through her innovative patent in silicon-and-germanium etching. Her work has implications for the advancement of semiconductor technology, which is crucial for modern electronics.

Latest Patents

Kalpana Suen holds 1 patent related to her work in semiconductor processing. The patent, titled "Silicon-and-germanium etching," describes exemplary methods that include providing a first fluorine-containing precursor to a remote plasma system of a semiconductor processing chamber. The methods involve generating plasma effluents of the first fluorine-containing precursor and providing them to a processing region of the chamber. Additionally, a second fluorine-containing precursor is introduced, and a substrate with alternating layers of silicon-and-germanium-containing material is etched using these plasma effluents.

Career Highlights

Kalpana Suen has established herself as a key figure in the semiconductor industry. She works at Applied Materials, Inc., a leading company in the field of materials engineering. Her expertise in semiconductor processing has positioned her as an influential inventor, contributing to advancements that enhance the efficiency and effectiveness of semiconductor manufacturing.

Collaborations

Throughout her career, Kalpana has collaborated with notable colleagues, including Anchuan Wang and Jiayin Huang. These partnerships have fostered innovation and have been instrumental in the development of new technologies in semiconductor processing.

Conclusion

Kalpana Suen's contributions to semiconductor processing through her innovative patent demonstrate her significant role in advancing technology in this critical field. Her work continues to influence the future of electronics and semiconductor manufacturing.