Xiamen, China

Kaixuan Zhang

This inventor holds 1 USPTO granted patent. Top assignee: Xiamen Sanan Integrated Circuit Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kaixuan Zhang. Retrieved from https://idiyas.com/inventor/kaixuan-zhang-c2drxv3m

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Kaixuan Zhang: Innovator in High-Electron-Mobility Transistor Technology

Introduction

Kaixuan Zhang is a prominent inventor based in Xiamen, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of high-electron-mobility transistors (HEMTs). His innovative work has led to advancements that are crucial for modern electronic devices.

Latest Patents

Kaixuan Zhang holds a patent for an "Epitaxial structure for high-electron-mobility transistor and method for manufacturing the same." This patent describes an epitaxial structure that includes a substrate, a nucleation layer, a buffer layered unit, a channel layer, and a barrier layer, all sequentially stacked. The buffer layered unit features at least one multiple quantum well structure containing several p-i-n heterojunction stacks. Each stack consists of p-type, i-type, and n-type layers, which are alternately arranged away from the nucleation layer, utilizing materials represented by the chemical formula AlGaN. The design allows for a gradual decrease in x and an increase in z, while y remains consistent, ranging from 0 to 0.7. This innovative structure enhances the performance of high-electron-mobility transistors.

Career Highlights

Kaixuan Zhang is currently employed at Xiamen Sanan Integrated Circuit Co., Ltd. His work at this company has positioned him as a key player in the semiconductor industry. His expertise in HEMT technology has contributed to the company's reputation for innovation and excellence in integrated circuits.

Collaborations

Kaixuan Zhang collaborates with talented individuals such as Yutao Fang and Boting Liu. Their combined efforts in research and development have led to significant advancements in semiconductor technology.

Conclusion

Kaixuan Zhang's contributions to high-electron-mobility transistor technology exemplify his innovative spirit and dedication to advancing the field. His patent and work at Xiamen Sanan Integrated Circuit Co., Ltd. highlight his role as a leading inventor in the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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