Tokyo, Japan

Kaito Sugiura

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Ricoh Company, Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kaito Sugiura. Retrieved from https://idiyas.com/inventor/kaito-sugiura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Kaito Sugiura: Innovator in Thermosensitive Recording Technology

Introduction

Kaito Sugiura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of thermosensitive recording technology. His innovative work has led to the development of a unique thermosensitive recording medium.

Latest Patents

Kaito Sugiura holds a patent for a thermosensitive recording medium and a method for producing it. This invention includes a support, a first underlayer, a second underlayer, and a thermosensitive recording layer. The second underlayer and the thermosensitive recording layer are formed by simultaneous curtain coating. The surface smoothness of the thermosensitive recording medium is 1,000 s or greater. This patent showcases his expertise and commitment to advancing recording technologies. He has 1 patent to his name.

Career Highlights

Kaito Sugiura is currently employed at Ricoh Company, Ltd., where he continues to innovate and develop new technologies. His work at Ricoh has allowed him to collaborate with other talented professionals in the field.

Collaborations

One of his notable coworkers is Kenji Shimizu. Their collaboration has contributed to the advancement of thermosensitive recording technologies.

Conclusion

Kaito Sugiura is a dedicated inventor whose work in thermosensitive recording technology has made a significant impact. His innovative patent reflects his expertise and commitment to the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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