Kyoto, Japan

Kairi Otani

This inventor holds 1 USPTO granted patent. Top assignee: Kyoto Elex Co., Ltd.. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kairi Otani. Retrieved from https://idiyas.com/inventor/kairi-otani-eyklo0ct

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Kairi Otani: Innovator in Semiconductor Technology

Introduction

Kairi Otani is a prominent inventor based in Kyoto, Japan. She has made significant contributions to the field of semiconductor technology, particularly through her innovative patent.

Latest Patents

Kairi Otani holds a patent for a conductive paste designed for forming a conductive film for semiconductor devices. This patent includes a unique formulation that consists of a conductive powder, specific additives such as selenium and tellurium compounds, glass frit, an organic binder, and a solvent. This invention aims to enhance the production and efficiency of semiconductor devices.

Career Highlights

Kairi Otani is associated with Kyoto Elex Co., Ltd., where she applies her expertise in semiconductor technology. Her work has been instrumental in advancing the capabilities of conductive materials used in electronic devices.

Collaborations

Kairi collaborates with notable colleagues, including Kazuya Takagi and Seiichi Nakatani, who contribute to her research and development efforts.

Conclusion

Kairi Otani's innovative work in semiconductor technology exemplifies her commitment to advancing the field. Her contributions through her patent reflect her expertise and dedication to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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