Guangdong, China

Kailang Liu

This inventor holds 1 USPTO granted patent. Top assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kailang Liu. Retrieved from https://idiyas.com/inventor/kailang-liu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Kailang Liu and His Patent for a Substrate Loading Platform Lift System.

Introduction

Kailang Liu is an inventor associated with Guangdong, China. His work includes a patent for a lift device and lift system designed for a substrate loading platform.

Latest Patents

Liu is listed as an inventor on 1 patent, titled “Lift Device and Lift System for Substrate Loading Platform.” The invention describes a carrying mechanism with a guiding hole, a lift pin that passes through the hole, and a carrying base connected to the pin. As the base moves upward, it raises the pin within the guiding hole. A magnetic control device sends a signal that moves the pin downward, where it is magnetically attracted. The design aims to help avoid process problems and reduce the risk of breakage.

Career Highlights

Liu is associated with Shenzhen China Star Optoelectronics Technology Co., Ltd. His patent focuses on a lifting mechanism for substrate handling, with magnetic control used to guide the lift pin’s downward movement.

Collaborations

The provided information lists Jiang Wang and Yan Li as Liu’s coworkers. No further details about their roles or contributions to the patent are available.

Conclusion

Kailang Liu’s patent presents a magnetically controlled lift-pin system intended to support substrate loading while helping prevent process issues and breakage.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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