Kai Pheng Tan

Title: Innovations by Inventor Kai Pheng Tan

Introduction

Kai Pheng Tan is a notable inventor based in Singapore, known for his contributions to semiconductor technology. He holds 2 patents that showcase his expertise in laser annealing methods for semiconductor layers. His work has significant implications for the development of advanced semiconductor devices.

Latest Patents

Tan's latest patents include a semiconductor device having a laser-annealed semiconductor layer. This innovative laser annealing method involves forming a nitrogen-doped layer on a semiconductor layer, with a nitrogen concentration of at least 3×10 atoms/cc. The process includes irradiating a first area of the nitrogen-doped layer in a low oxygen environment with a laser beam, as well as a second area that overlaps with the first. Another patent focuses on the method of laser annealing semiconductor layers and the devices produced through this technique, further emphasizing the importance of his research in the field.

Career Highlights

Throughout his career, Tan has worked with prominent companies such as Japan Display Inc. and Toshiba Matsushita Display Technology Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in display technology.

Collaborations

Some of his notable coworkers include Kian Kiat Lim and Atsushi Nakamura, who have collaborated with him on various projects, enhancing the innovation landscape in semiconductor technology.

Conclusion

Kai Pheng Tan's work in semiconductor technology and his innovative patents highlight his role as a key inventor in the field. His contributions continue to influence advancements in semiconductor devices and laser annealing methods.