Company Filing History:
Years Active: 1999
Title: Innovations by Inventor Kai-Ning Chang
Introduction: Kai-Ning Chang is a notable inventor based in San Jose, California. He has made significant contributions to the field of semiconductor manufacturing. His innovative methods have paved the way for advancements in technology.
Latest Patents: Kai-Ning Chang holds a patent titled "Method for reducing stray conductive material near vertical surfaces in semiconductor manufacturing processes." This patent outlines a comprehensive method that includes several steps to enhance the manufacturing process. The method involves depositing various layers, applying masks, etching, and forming structures to prevent stringer formation, ensuring a more efficient and effective semiconductor production.
Career Highlights: Chang is currently associated with Integrated Silicon Solution Incorporated, where he continues to work on cutting-edge technologies. His expertise in semiconductor processes has been instrumental in developing solutions that address common challenges in the industry.
Collaborations: One of his notable coworkers is Weiran Kong, with whom he collaborates on various projects. Their combined efforts contribute to the innovative environment at their company.
Conclusion: Kai-Ning Chang's work exemplifies the spirit of innovation in semiconductor manufacturing. His patent and ongoing contributions reflect his commitment to advancing technology in this critical field.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.