This inventor holds 1 USPTO granted patent. Top assignee: Inotera Memories, Inc.. Active years: 2015.
Company Filing History:
Years Active: 2015
Title: Innovations of Kai-Lun Chiang in Memory Cell Technology
Introduction
Kai-Lun Chiang is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in memory cell design. His innovative work has led to the development of a unique memory cell that enhances performance and efficiency.
Latest Patents
One of Kai-Lun Chiang's key patents is titled "Memory cell having a recessed gate and manufacturing method thereof." This patent describes a memory cell that includes a semiconductor substrate, shallow trench isolation, an active region, a gate electrode, a halogen-doped dielectric layer, and at least one capacitor. The shallow trench isolation is strategically placed in the semiconductor substrate to define the active region. The design features a source region and a drain region located at each end of the active region along a specified direction. A gate trench is formed in the semiconductor substrate between the source and drain regions, which includes a sidewall portion and a curved-bottom surface. The curved-bottom surface has a convex profile when viewed from a cross-sectional perspective taken along a direction perpendicular to the first direction. The gate electrode is positioned within the gate trench, and the halogen-doped dielectric layer is situated between the gate electrode and the semiconductor substrate. This innovative design has the potential to improve memory cell performance significantly.
Career Highlights
Kai-Lun Chiang is currently associated with Inotera Memories, Inc., where he continues to push the boundaries of memory technology. His work has been instrumental in advancing the capabilities of memory cells, making them more efficient and reliable.
Collaborations
Throughout his career, Kai-Lun Chiang has collaborated with esteemed colleagues such as Ping Kao and Chien-Chi Lee. These collaborations have fostered an environment of innovation and have contributed to the success of their projects.
Conclusion
Kai-Lun Chiang's contributions to memory cell technology exemplify the spirit of innovation in the semiconductor industry. His patent on the recessed gate memory cell showcases his expertise and commitment to advancing technology. His work continues to influence the field and inspire future developments.