Munich, Germany

Kai Luebbers

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Rheinmetall Waffe Munition Gmbh. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kai Luebbers. Retrieved from https://idiyas.com/inventor/kai-luebbers

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Kai Luebbers and the Irritation Member Patent

Introduction

Kai Luebbers is an inventor based in Munich, Germany, associated with Rheinmetall Waffe Munition GmbH. His patent work includes an irritation member designed with a distinctive housing and a recessed actuation element.

Latest Patents

Luebbers is credited with 1 patent, titled “Irritation member.” The invention describes a parallelepipedal housing with front and rear sides larger than its connecting lateral surfaces. Blow-out openings are located on the lateral surfaces, while the actuation element sits in a recess. When not actuated, the element remains within the recess and does not increase the housing’s size, giving the device an appearance unlike that of a conventional irritation member.

Career Highlights

Luebbers’s listed patent reflects work on the design and configuration of an irritation member. The recessed actuation element is a central feature, allowing the housing to retain a compact exterior when the device is not in use.

Collaborations

Luebbers’s listed coworkers include Julia Heering and Philip Weber. The provided information identifies them as colleagues but does not specify their roles in the patent.

Conclusion

Kai Luebbers’s patent presents a distinctive irritation-member design that combines lateral blow-out openings with a recessed actuation element.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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